VLSI fabrication principles: silicon and gallium arsenide

Book Review
Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits.

Contents
1-Material Properties.
2-Phase Diagrams and Solid Solubility.
3-Crystal Growth and Doping.
4-Diffusion.
5-Epitaxy.
6-Ion Implantation.
7-Native Films.
8-Deposited Films.
9-Etching and Cleaning.
10-Lithographic Processes.
11-Device and Circuit Fabrication.
Appendix.
Index.

Download
You can download this book from any of the following links. If any link is dead please feel free to leave a comment.
LINK 1
LINK 2

Copyright Disclaimer:
This site does not store any files on its server. We only index and link to content provided by other sites. Please contact the content providers to delete copyright contents if any and email us, we'll remove relevant links or contents immediately.


Share this article :

Post a Comment

 
Support : Creating Website | Johny Template | Mas Template
Copyright © 2011. FREE ENGINEERING BOOKS - All Rights Reserved
Template Created by Creating Website Published by Mas Template
Proudly powered by Blogger