Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits.
2-Phase Diagrams and Solid Solubility.
3-Crystal Growth and Doping.
9-Etching and Cleaning.
11-Device and Circuit Fabrication.
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