Friday, 25 January 2013

VLSI fabrication principles: silicon and gallium arsenide

Book Review
Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits.

Contents
1-Material Properties.
2-Phase Diagrams and Solid Solubility.
3-Crystal Growth and Doping.
4-Diffusion.
5-Epitaxy.
6-Ion Implantation.
7-Native Films.
8-Deposited Films.
9-Etching and Cleaning.
10-Lithographic Processes.
11-Device and Circuit Fabrication.
Appendix.
Index.

Download
You can download this book from any of the following links. If any link is dead please feel free to leave a comment.
LINK 1
LINK 2

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